Deep surface relief grating in azobenzene-containing materials using a low-intensity 532 nm laser

被引:12
|
作者
Sakhno O. [1 ]
Goldenberg L.M. [2 ]
Wegener M. [1 ]
Stumpe J. [3 ]
机构
[1] Fraunhofer Institute for Applied Polymer Research, Geiselbergstr. 69, Potsdam-Golm
[2] Fraunhofer Institute for Applied Polymer Research, Kantstrasse 55, Teltow
[3] UP Transfer GmbH an der Universität Potsdam, Am Neuen Palais 10, Potsdam
来源
Optical Materials: X | 2019年 / 1卷
关键词
Azobenzene-containing materials; Glassy material; Holographic exposure; Surface relief grating;
D O I
10.1016/j.omx.2019.100006
中图分类号
学科分类号
摘要
The inscription of deep surface relief grating (SRG) in glassy monomeric azobenzene materials using a low intensity diode pumped solid state (DPSS) laser operating at 532 nm is demonstrated. Previously developed epoxy-based star-like azobenzene-containing material was applied. Both deep SRG and multi-dimensional structures can be fabricated using this cheap, effective material in combination with a low cost laser source. The dependencies of the SRG performance (amplitude, inscription rate, stability) on exposure conditions (time, intensity) and layer thickness are presented. The replication of the inscribed gratings using polydimethylsiloxane is demonstrated. The results show that effective all-optical fabrication of surface relief master-gratings can be realized using low cost chemistry and widely used low-intensity coherent light source operating at 532 nm. © 2019
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