Band alignment of γ-phase CuI/high-k Al2O3 heterointerface by X-ray photoelectron spectroscopy

被引:3
|
作者
Kim, Tae In [1 ]
Lee, Hyun-Ah [2 ]
Kwon, Hyuck-In [2 ]
Park, Ick-Joon [3 ]
机构
[1] Inha Univ, Dept Elect Engn, Incheon 22212, South Korea
[2] Chung Ang Univ, Sch Elect & Elect Engn, Seoul 06974, South Korea
[3] Joongbu Univ, Dept Elect & Elect Engn, Goyang 10279, South Korea
基金
新加坡国家研究基金会;
关键词
gamma-phase CuI/Al 2 O 3 heterojunction; High-k Al 2 O 3; p -type metal halide; Band alignment; X-ray photoelectron spectroscopy; COPPER IODIDE; CUI; SEMICONDUCTOR; DIODES; FILMS; MOS2;
D O I
10.1016/j.surfin.2024.104190
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Copper Iodide (CuI) has attracted considerable attention as a p-channel building block for advanced optoelectronic applications. Here, we determine the energy band alignment at the gamma-phase CuI/high-k Al2O3 heterointerface by high-resolution X-ray photoelectron spectroscopy. The optical characteristics of the gamma-phase CuI are studied by UV-Vis spectrophotometry and Raman spectroscopy, and the surface topography is evaluated by atomic force microscopic and scanning electron microscopic analysis. The energy band alignments with the valence band offset (VBO) and the conduction band offset (CBO) at the gamma-phase CuI/high-k Al2O3 heterojunction are experimentally determined, which are also confirmed by using Anderson's rule measured by ultraviolet photoelectron spectroscopy. The interfacial charge transport dynamics across the heterointerface are systematically investigated, revealing a type I band alignment at the gamma-phase CuI/high-k Al2O3 heterojunction with the higher VBO of 2.93 +/- 0.05 eV than the CBO of 0.65 eV +/- 0.05 eV with band bending effect. Thus, this work can provide valuable information on the determination of the energy band alignment at the metal halide/high-k Al2O3 heterointerface for designing high performance optoelectronic applications.
引用
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页数:9
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