Effects of Pulsed Bias on the Corrosion Behavior of Diamond-like Carbon Film Prepared on the Surface of 316L Stainless Steel

被引:0
作者
Chen D. [1 ]
Guo Y. [1 ]
Qi J. [1 ]
Zhou Y. [1 ]
机构
[1] School of Materials and Metallurgy, University of Science and Technology Liaoning, Anshan
来源
Zhongguo Biaomian Gongcheng/China Surface Engineering | 2022年 / 35卷 / 05期
基金
中国国家自然科学基金;
关键词
chemical vapor deposition; corrosion behavior; diamond-like carbon film; plasma; pulsed bias;
D O I
10.11933/j.issn.1007-9289.20211230001
中图分类号
学科分类号
摘要
In order to improve the localized corrosion resistance of stainless steel, plasma-enhanced chemical vapor deposition (PECVD) technology is used to prepare hydrogen-containing diamond-like carbon (DLC) film on the surface of 316L stainless steel. The effects of different pulsed bias on the hybrid structure and corrosion behavior of the film are investigated, and the related influence mechanisms are also discussed. The results are showed that pulse bias voltage mainly affects the hybrid structure and microstructure of the DLC film on 316L stainless steel surface, and finally the corrosion behavior is affected. With the increase of pulse bias voltage, the degree of plasma ionization increases, the thermal peak effect and sputtering effect during the deposition process are enhanced, the hydrogen content in the DLC film decreases, the local corrosion susceptibility of the film is reduced, and the number of pitting pits in the film is reduced. But at the same time, the relative content of sp2 hybrid structure in the film also increases with the increase of pulse bias voltage, which leads to the accelerated corrosion rate of the film and the increase of the pit radius. As the bias voltage increases from 1.4 kV to 2.6 kV, the annual corrosion rate of 316L stainless steel increases from 9.33 nm/y to 62.4 nm/y. When the pulse bias voltage is 1.4 kV, although the annual corrosion rate is the lowest, the film is most prone to pitting corrosion, and its long-term service life is poor. When the bias voltage is 2.6 kV, the plasma energy is too high, and the thin film is etched excessively, resulting in increased defects and poor corrosion resistance. In the research range, when the pulse bias voltage is 2.2 kV, the DLC film has high pitting corrosion resistance and low annual corrosion rate, showing the best comprehensive corrosion resistance. © 2022 Chinese Mechanical Engineering Society. All rights reserved.
引用
收藏
页码:272 / 278
页数:6
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