Conformal and superconformal chemical vapor deposition of silicon carbide coatings

被引：0
|
作者：
Huang, Jing-Jia [1 ,2 ]
Militzer, Christian [1 ,2 ]
Wijayawardhana, Charles [1 ,2 ]
Forsberg, Urban [1 ]
Pedersen, Henrik [1 ]
机构：
[1] Department of Physics, Chemistry and Biology, Linköping University, Linköping,SE-58328, Sweden
[2] SGL Carbon GmbH, Drachenburgstraße 1, Bonn,DE-53170, Germany
来源：
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films | 2022年 / 40卷 / 05期
关键词：
Compilation and indexing terms; Copyright 2025 Elsevier Inc;
D O I：
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学科分类号：
摘要：
Chlorine compounds - Growth kinetics - Hard coatings - Low pressure chemical vapor deposition - Polycrystalline materials - Silicon carbide
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