共 20 条
[11]
Ku W., Storer R.H., Georgakis C., Disturbance detection and isolation by dynamic principal component analysis, Chemometrics & Intelligent Laboratory Systems, 30, 1, pp. 179-196, (1995)
[12]
Rato T.J., Reis M.S., Fault detection in the Tennessee Eastman benchmark process using dynamic principal components analysis based on decorrelated residuals (DPCA-DR), Chemometrics & Intelligent Laboratory Systems, 125, 7, pp. 101-108, (2013)
[13]
Wang G., Liu J., Zhang Y., A novel multimode data processing method and its application in industrial process monitoring, Journal of Chemometrics, 29, 2, pp. 126-138, (2015)
[14]
He Q.P., Wang J., Fault detection using the k-nearest neighbor rule for semiconductor manufacturing processes, IEEE Transactions on Semiconductor Manufacturing, 20, 4, pp. 345-354, (2007)
[15]
Ma H., Hu Y., Shi H., A novel local neighborhood standardization strategy and its application in fault detection of multimode processes, Chemometrics & Intelligent Laboratory Systems, 118, 7, pp. 287-300, (2012)
[16]
Rato T.J., Reis M.S., Advantage of using decorrelated residuals in dynamic principal component analysis for monitoring large-scale systems, Industrial & Engineering Chemistry Research, 52, 38, pp. 13685-13698, (2013)
[17]
Dehnad K., Density estimation for statistics and data analysis, Technometrics, 29, 4, pp. 296-297, (1986)
[18]
Wang J., He Q.P., Multivariate statistical process monitoring based on statistics pattern analysis, Industrial & Engineering Chemistry Research, 49, 17, pp. 7858-7869, (2010)
[19]
Cheng C.Y., Hsu C.C., Chen M.C., Adaptive kernel principal component analysis (KPCA) for monitoring small disturbances of nonlinear processes, Industrial & Engineering Chemistry Research, 49, 5, pp. 2254-2262, (2011)
[20]
Zhou Z., Wen C., Yang C., Fault detection using random projections and k-nearest neighbor rule for semiconductor manufacturing processes, IEEE Transactions on Semiconductor Manufacturing, 28, 1, pp. 70-79, (2015)