Application of Cerium Oxide Nanopowders for Silicon Polishing

被引：0

作者：

Chkhalo, N. I. ^{[1
]}

Akhsakhalyan, A. A. ^{[1
]}

Vainer, Yu. A. ^{[1
]}

Zorina, M. V. ^{[1
]}

Pestov, A. E. ^{[1
]}

Svechnikov, M. V. ^{[1
]}

Toropov, M. N. ^{[1
]}

Kumar, N. ^{[1
]}

Tokunov, Yu. M. ^{[2
]}

机构：

[1] Russian Acad Sci, Inst Phys Microstruct, Nizhnii Novgorod 607680, Russia

[2] MIPT, Dolgoprudnyi 141701, Moscow Oblast, Russia

来源：

TECHNICAL PHYSICS | 2024年 / 69卷 / 04期

关键词：

surface; roughness; X-ray optics; deep grinding-polishing; X-RAY-SCATTERING; SURFACES;

D O I：

10.1134/S106378422403006X

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The research methods and the first results obtained in the study of the roughness of single-crystal silicon (111) substrates processed at the final stage by various methods are described: traditional polishing without the use of chemical-mechanical polishing (CMP), with the use of CMP and without CMP, but with the use of oxide cerium nanopowders. The efficiency of using CeO2 nanopowders has been demonstrated. The following effective roughness values were obtained: without CMP-3.56 nm, with CMP-0.54 nm, and without CMP, but with CeO2 polishing-0.93 nm.

引用

页码：824 / 832

页数：9

共 50 条

[1] Chemical mechanical glass polishing with cerium oxide: Effect of selected physico-chemical characteristics on polishing efficiency
Janos, Pavel
Ederer, Jakub
Pilarova, Vera
Henych, Jiri
Tolasz, Jakub
Milde, David
Opletal, Tomas
WEAR, 2016, 362 : 114 - 120
[2] Cerium oxide immobilized paper matrices for bactericidal application
Agarwal, Charu
Aggrawal, Sudiksha
Dutt, Dharm
Mohanty, Paritosh
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2018, 232 : 1 - 7
[3] MOCVD growth of porous cerium oxide thin films on silicon substrate
Avril, L.
Zanfoni, N.
Simon, P.
Imhoff, L.
Bourgeois, S.
Domenichini, B.
SURFACE & COATINGS TECHNOLOGY, 2015, 280 : 148 - 153
[4] Thermoluminescence and decay studies on cerium doped ZnO nanopowders
Panda, N. R.
Acharya, B. S.
Singh, Th. Basanta
Gartia, R. K.
MATERIALS LETTERS, 2013, 95 : 205 - 208
[5] Structural and chemical characterization of cerium oxide thin layers grown on silicon substrate
Potin, V.
Lavkova, J.
Bourgeois, S.
Dubau, M.
Matolinova, I.
Matolin, V.
MATERIALS TODAY-PROCEEDINGS, 2015, 2 (01) : 101 - 107
[6] Effects of HEC Concentration on Silicon Polishing
Yang, Jin
Lu, Shibin
Wang, Haibo
Fan, Min
Jiang, Xianwei
Zhang, Zhongxiang
SILICON, 2019, 11 (04) : 2059 - 2066
[7] Ultrathin, epitaxial cerium dioxide on silicon
Flege, Jan Ingo
Kaemena, Bjoern
Hoecker, Jan
Bertram, Florian
Wollschlaeger, Joachim
Schmidt, Thomas
Falta, Jens
APPLIED PHYSICS LETTERS, 2014, 104 (13)
[8] Application of ellipsometry for the accurate oxide layer measurement on silicon spheres
Busch, Ingo
Liu, Wende
Chen, Chi
Luo, Zhiyong
Koenders, Ludger
APPLIED SURFACE SCIENCE, 2017, 421 : 624 - 629
[9] A phenomenological model of polishing of silicon with diamond abrasive
Agrawal, Paras M.
Narulkar, R.
Bukkapatnam, S.
Raff, L. M.
Komanduri, R.
TRIBOLOGY INTERNATIONAL, 2010, 43 (1-2) : 100 - 107
[10] Investigation on Fine Polishing Technique of Silicon Wafer
Gong Quancheng
Zhu Jian
Jia Shixing
Wu Jing
MICRO AND NANO TECHNOLOGY: 1ST INTERNATIONAL CONFERENCE OF CHINESE SOCIETY OF MICRO/NANO TECHNOLOGY(CSMNT), 2009, 60-61 : 232 - 235

← 1 2 3 4 5 →