Vertical β-Ga2O3 Power Diodes: From Interface Engineering to Edge Termination

被引:1
|
作者
Wen, Junpeng [1 ]
Hao, Weibing [1 ]
Han, Zhao [1 ]
Wu, Feihong [1 ]
Li, Qiuyan [1 ]
Liu, Jinyang [1 ]
Liu, Qi [1 ]
Zhou, Xuanze [1 ]
Xu, Guangwei [1 ]
Yang, Shu [1 ]
Long, Shibing [1 ]
机构
[1] Univ Sci & Technol China USTC, Sch Microelect, Hefei 230026, Peoples R China
基金
中国国家自然科学基金;
关键词
Beta-gallium oxide (beta-Ga2O3); edge termination; interface engineering; large-size diode; p-n diode; Schottky barrier diode (SBD); SCHOTTKY-BARRIER DIODE; REVERSE RECOVERY; BALIGAS FIGURE; SURGE-CURRENT; PERFORMANCE; RESISTANCE; VOLTAGE; DESIGN; MERIT; OXIDE;
D O I
10.1109/TED.2024.3360016
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Ultra wide bandgap semiconductor beta-gallium oxide (beta-Ga2O3) has the potential in fabricating the next generation of power devices applied at high temperature and high voltage due to its superior material properties and cost competitiveness. However, the performance of the existing beta-Ga2O3 power diodes is far from the theoretical value because of the restriction of interface quality and edge electric field crowding effect. In this review, we introduce several effective interface engineering and edge termination techniques commonly used in vertical beta-Ga2O3 diodes, highlighting their design principles, key fabrication processes, physical mechanism, and merit/demerit. To realize the actual applications, the representative large-size beta-Ga2O3 diodes that can allow large level current to flow are also discussed. In addition, possible optimization strategies for these techniques are proposed for researchers' reference. This article will help researchers understand the current study status of vertical beta-Ga2O3 diodes and inspire researchers for future innovation in this emerging and exciting field. Moreover, the techniques and optimization strategies mentioned can also be applied to other semiconductors.
引用
收藏
页码:1606 / 1617
页数:12
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