Study of the mechanism of single event burnout in lateral depletion-mode Ga2O3 MOSFET devices via TCAD simulation

被引:2
|
作者
Wang, Kejia [1 ]
Wang, Zujun [2 ]
Cao, Rongxing [3 ,4 ]
Liu, Hanxun [3 ]
Chang, Wenjing [1 ]
Zhao, Lin [5 ]
Mei, Bo [6 ]
Lv, He [6 ]
Zeng, Xianghua [1 ]
Xue, Yuxiong [3 ,4 ]
机构
[1] Yangzhou Univ, Coll Phys Sci & Technol, Yangzhou 225002, Peoples R China
[2] Northwest Inst Nucl Technol, State Key Lab Intense Pulse Radiat Simulat & Effec, Xian 710024, Peoples R China
[3] Yangzhou Univ, Coll Elect Energy & Power Engn, Yangzhou 225127, Peoples R China
[4] Innovat Ctr Radiat Applicat, Beijing 102413, Peoples R China
[5] Harbin Inst Technol, Inst Special Environm Phys Sci, Shenzhen 518055, Peoples R China
[6] China Acad Space Technol, Beijing 100029, Peoples R China
基金
中国国家自然科学基金;
关键词
HEAVY-ION IRRADIATION; GALLIUM OXIDE;
D O I
10.1063/5.0184704
中图分类号
O59 [应用物理学];
学科分类号
摘要
This study investigates the sensitive region and safe operation voltage of single-event burnout (SEB) in lateral depletion-mode Ga2O3 MOSFET devices via technology computer aided design simulation. Based on the distribution of the electric field, carrier concentration, and electron current density when SEB occurs, the radiation damage mechanism of SEB is proposed. The mechanism of SEB in Ga2O3 MOSFET was revealed to be the result of a unique structure without a PN junction within it, which possesses gate control ability and exerts a significant influence on the conduction of the depletion region. (c) 2024 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
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页数:8
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