Preparation and optical properties of siox thin films using different reactive magnetron sputtering technology

被引：0

作者：

Chen, Q.F. ^{[1
,2
]}

Li, Y.Y. ^{[1
,2
]}

Ying, P.Y. ^{[1
,2
]}

Wang, T.L. ^{[1
,2
]}

Zhang, P. ^{[1
,2
]}

Wu, J.B. ^{[1
,2
]}

Huang, M. ^{[1
,2
]}

Fang, Y.H. ^{[1
,2
]}

Levchenko, V. ^{[1
,2
]}

机构：

[1] [1,Chen, Q.F.

[2] 1,Li, Y.Y.

[3] 1,Ying, P.Y.

[4] 1,Wang, T.L.

[5] 1,Zhang, P.

[6] 1,Wu, J.B.

[7] 1,Huang, M.

[8] 1,Fang, Y.H.

[9] 1,Levchenko, V.

来源：

Zhang, P. (zhangp03@126.com); Zhang, P. (zhangp03@126.com) | 1600年 / National Institute of Optoelectronics卷 / 14期

关键词：

Refractive index;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：9 / 10

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