Synergy of slippery surface and pulse flow: An anti-scaling solution for direct contact membrane distillation

被引:1
作者
Liu Y. [1 ,2 ,3 ]
Li Z. [4 ]
Xiao Z. [1 ,3 ]
Yin H. [5 ]
Li X. [1 ]
He T. [1 ]
机构
[1] Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai
[2] School of Physical Science and Technology, ShanghaiTech University, Shanghai
[3] University of Chinese Academy of Sciences, Beijing
[4] National Key Laboratory of Fine Chemical Engineering, Department of Polymer Materials, Dalian University of Technology, Dalian
[5] School of Engineering, University of Glasgow, Glasgow
来源
He, Tao (het@sari.ac.cn) | 1600年 / Elsevier B.V., Netherlands卷 / 603期
基金
中国国家自然科学基金; 俄罗斯基础研究基金会;
关键词
Pinned wetting; Scaling; Slippery; Superhydrophobic; Suspended wetting;
D O I
10.1016/j.memsci.2020.118035
中图分类号
学科分类号
摘要
Recent progress on mitigating scaling on hydrophobic membrane distillation (MD) membrane focuses on the design of superhydrophobic/omniphobic surface and process optimization. However, the rationale for scaling resistance is not yet complete. We attempted in this work to unravel the correlation of scaling resistance based on the synergy of slippery surface (via chem-physical engineering) and pulse flow (process engineering). Superhydrophobic micro-pillared polyvinylidene fluoride (MP-PVDF) and CF4 plasma modified MP-PVDF (CF4-MP-PVDF) were utilized as the model membranes. We proposed rheometry as a simple quantitative measure for the wetting state in a hydrodynamic environment. Results showed that MP-PVDF possessed pinned wetting and prone to scaling (2000 mg/L CaSO4 solution) in both steady and pulse flow. In contrast, the CF4-MP-PVDF showed suspended wetting and excellent scaling resistance (at water recovery of 60%, the CF4-MP-PVDF surface was still clean without any crystals) under pulse flow, but not at steady flow. At steady flow, feed over-pressure changes the suspended wetting to pinned wetting by pushing the water-gas interface into the pillars, thereby resulting in scaling for CF4-MP-PVDF. At pulse flow, rhythmic fluctuation in the water-gas interface for CF4-MP-PVDF led to sustained scaling resistance. For the first time, we experimentally demonstrated a scaling resistance in DCMD via engineering surface wetting state and process. We envision that this rationale would pave the forward-looking strategy for a robust stable MD process in the near future. © 2020 Elsevier B.V.
引用
收藏
相关论文
共 45 条
  • [1] Alkhudhiri A., Darwish N., Hilal N., Membrane distillation: a comprehensive review, Desalination, 287, pp. 2-18, (2012)
  • [2] Schneider K., Vangassel T.J., Membrane distillation, Chem. Ing. Tech., 56, pp. 514-521, (1984)
  • [3] Lu K.J., Cheng Z.L., Chang J., Luo L., Chung T.-S., Design of zero liquid discharge desalination (ZLDD) systems consisting of freeze desalination, membrane distillation, and crystallization powered by green energies, Desalination, 458, pp. 66-75, (2019)
  • [4] Tong T., Elimelech M., The global rise of zero liquid discharge for wastewater management: drivers, technologies, and future directions, Environ. Sci. Technol., 50, pp. 6846-6855, (2016)
  • [5] Deshmukh A., Boo C., Karanikola V., Lin S., Straub A.P., Tong T., Warsinger D.M., Elimelech M., Membrane distillation at the water-energy nexus: limits, opportunities, and challenges, Energy Environ. Sci., 11, pp. 1177-1196, (2018)
  • [6] Alklaibi A.M., Lior N., Membrane-distillation desalination: status and potential, Desalination, 171, pp. 111-131, (2005)
  • [7] Warsinger D.M., Swarninathan J., Guillen-Burrieza E., Arafat H.A., Lienhard J.H., Scaling and fouling in membrane distillation for desalination applications: a review, Desalination, 356, pp. 294-313, (2015)
  • [8] Tijing L.D., Woo Y.C., Choi J.-S., Lee S., Kim S.-H., Shon H.K., Fouling and its control in membrane distillation—a review, J. Membr. Sci., 475, pp. 215-244, (2015)
  • [9] Salmon I.R., Luis P., Membrane crystallization via membrane distillation, Chem. Eng. Process. Process Intensification, 123, pp. 258-271, (2018)
  • [10] Johnson W.A., Mehl R.F., Reaction kinetics in processes of nucleation and growth, Trans. Am. Inst. Min. Metall. Eng., 135, pp. 416-442, (1939)