Measurement of Cryogenic Thermal Contact Resistance of Brass by Lamination Method

被引：0
|
作者：
Shen Y. [1 ]
Cao J. [2 ]
Huang Y. [1 ]
机构：
[1] Institute of Refrigeration and Cryogenics, Shanghai Jiao Tong University, Shanghai
[2] Shanghai Precision Metrology and Testing Research Institute, Shanghai
来源：
Shanghai Jiaotong Daxue Xuebao/Journal of Shanghai Jiaotong University | 2023年 / 57卷 / 01期
关键词：
brass; cryocooler; cryogenic; lamination method; measurement; thermal contact resistance (TCR);
D O I：
10.16183/j.cnki.jsjtu.2021.394
中图分类号：
学科分类号：
摘要：
Prior studies on cryogenic thermal contact resistance (TCR) measurement mainly focus on liquid nitrogen temperature region and above. There are limited solid TCR data in the lower temperature region. The present measurement is based on an RDK-408D2 two-stage G-M cryogenic refrigerator. By using the laminated method, the TCR data of brass samples in the temperature range of 10—30 K at different roughnesses and preloads are measured and the influence of different factors on TCR is discussed. The results show that the TCR of the brass contact surface in this temperature zone is between 6.89×10-4 and 1.86×10-2 m2·W/K. With a smaller roughness of the contact surface, higher temperature, and greater pre-tightening force, the TCR becomes smaller. This behavior is consistent with the conventional qualitative understanding. The above cryogenic experimental data can provide certain support for the calculation of TCR for related cryogenic application design. © 2023 Shanghai Jiao Tong University. All rights reserved.
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页码：76 / 83
页数：7
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