Automatic generation of CD-SEM imaging sequence including optimization of addressing region of interest

被引：0

作者：

Miyamoto A. ^{[1
]}

Kawahara T. ^{[2
]}

机构：

[1] Hitachi, Ltd., Research and Development Group, 292, Yoshida-cho, Totsuka-ku, Yokohama, Kanagawa

[2] Hitachi High-Technologies Corporation 882, Ichige, Hitachinaka, Ibaraki

来源：

IEEJ Transactions on Electronics, Information and Systems | 2019年 / 139卷 / 08期

关键词：

Addressing; CD-SEM; Design data; Multifactor layout analysis method; Region of interest;

D O I：

10.1541/ieejeiss.139.927

中图分类号：

学科分类号：

摘要：

Critical dimension scanning electron microscope (CD-SEM) is widely used as an essential tool for measuring semiconductor patterns formed on a silicon wafer. For achieving a reliable measurement, CD-SEM requires to set up imaging sequence including correction of imaging position. The imaging region including unique patterns is selected manually as addressing point (AP) and positional error can be detected by a design-SEM matching at AP. In our previous work, we developed a multifactor layout analysis (MLA) method, which automatically selects AP position from design layout data of semiconductor patterns. In this paper, we propose an enhanced MLA method, which simultaneously optimizes position and size of the matching region of interest (ROI). For 100 evaluation points, the proposed method optimized the ROI region, which led to 51.3% reduction in addressing time compared to the conventional MLA method. c 2019 The Institute of Electrical Engineers of Japan.

引用

页码：927 / 935

页数：8

共 16 条

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