Effect of Annealing on Stress, Microstructure, and Interfaces of NiV/B4C Multilayers

被引:1
作者
Chang, Chenyuan [1 ]
Wei, Zhenbo [1 ]
Jiang, Hui [2 ]
Ni, Hangjian [1 ]
Song, Wentao [1 ]
He, Jialian [1 ]
Xiang, Simeng [1 ]
Wang, Zhanshan [1 ]
Zhang, Zhe [1 ]
Zhang, Zhong [1 ]
机构
[1] Tongji Univ, Inst Precis Opt Engn, Sch Phys Sci & Engn, Key Lab Adv Microstruct Mat,MOE, Shanghai 200092, Peoples R China
[2] Chinese Acad Sci, Shanghai Adv Res Inst, Shanghai Synchrotron Radiat Facil, 239 Zhangheng Rd, Shanghai 201204, Peoples R China
关键词
NiV/B4C multilayer; microstructure; annealing; stress; interface roughness; X-RAY-SCATTERING; MIRRORS; REFLECTION; STABILITY;
D O I
10.3390/coatings14040513
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The functionality and reliability of nanoscale multilayer devices and components are influenced by changes in stress and microstructure throughout fabrication, processing, and operation. NiV/B4C multilayers with a d-spacing of 3 nm were prepared by magnetron sputtering, and two groups of annealing experiments were performed. The stress, microstructure, and interface changes in NiV/B4C after annealing were investigated by grazing-incidence X-ray reflectometry (GIXR), grazing-incidence X-ray diffraction (GIXRD), X-ray diffuse scattering, and grazing-incidence small-angle X-ray scattering (GISAXS). The temperature dependence experiments revealed a gradual shift in the multilayer stress from compression to tension during annealing from 70 degrees C to 340 degrees C, with the stress approaching near-zero levels between 70 degrees C and 140 degrees C. The time-dependent experiments indicated that most of the stress changes occurred within the initial 10 min, which showed that prolonged annealing was unnecessary. Combining the X-ray diffraction and X-ray scattering measurements, it was found that the changes in the thickness, interface roughness, and lateral correlation length, primarily due to crystallization, drove the changes in stress and microstructure.
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页数:17
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