A correction procedure for secondary scattering contributions from windows in small-angle X-ray scattering and ultra-small-angle X-ray scattering

被引：1

作者：

Chevremont, William ^{[1
]}

Narayanan, Theyencheri ^{[1
]}

机构：

[1] ESRF European Synchrotron, 71 Ave Martyrs, F-38043 Grenoble, France

来源：

JOURNAL OF APPLIED CRYSTALLOGRAPHY | 2024年 / 57卷 / Pt 2期

关键词：

secondary scattering; SAXS; small-angle X-ray scattering; USAXS; ultra-small-angle X-ray scattering; sample-dependent background; LIGHT;

D O I：

10.1107/S1600576724001997

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

This article describes a correction procedure for the removal of indirect background contributions to measured small-angle X-ray scattering patterns. The high scattering power of a sample in the ultra-small-angle region may serve as a secondary source for a window placed in front of the detector. The resulting secondary scattering appears as a sample-dependent background in the measured pattern that cannot be directly subtracted. This is an intricate problem in measurements at ultra-low angles, which can significantly reduce the useful dynamic range of detection. Two different procedures are presented to retrieve the real scattering profile of the sample.

引用

页码：440 / 445

页数：6

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