Co-deposition of bismuth-nitrogen films on MgO (001) by molecular beam epitaxy

被引:1
作者
Shrestha, Ashok [1 ]
Abbas, Ali [1 ]
Ingram, David C. [1 ]
Smith, Arthur R. [1 ]
机构
[1] Ohio Univ, Nanoscale & Quantum Phenomena Inst, Dept Phys & Astron, Athens, OH 45701 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2024年 / 42卷 / 02期
关键词
SINGLE DIRAC CONE; TOPOLOGICAL-INSULATOR; THIN-FILMS; GROWTH; ORIENTATION;
D O I
10.1116/6.0003118
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We attempted to grow a thin film of BiN by co-deposition of bismuth and nitrogen on rock-salt structure MgO (001) substrates. Furthermore, we studied the effect of variation of the growth temperature and the nitrogen to bismuth flux ratios on sample growth. For the samples grown and conditions used, we do not find strong evidence for the formation of a bulk Bi-N alloy. Even for very high nitrogen to bismuth flux ratio, we observed only bismuth and no nitrogen using bulk Rutherford back-scattering spectroscopy measurements, and only 1%-2% nitrogen was seen through surface Auger electron spectroscopy measurements. The in-plane lattice measurements show that the resulting Bi (110) samples are strained, which is presumably caused by lattice mismatch between the sample and the substrate when grown without any buffer layer. The use of a high-temperature buffer layer helps to release strain in the sample but only along one axis. Measurements of the atomic layer spacing using x-ray diffraction and also scanning tunneling microscopy confirm the Bi (110) thin film sample structure.
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页数:9
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