Self-pinning colloids on rough surface

被引:0
作者
Hemanth, Beemanadhuni [1 ]
Bharti, Rohit [1 ]
Parmar, Avanish Singh [2 ]
Ghosh, Udita U. [1 ]
机构
[1] Indian Inst Technol BHU, Dept Chem Engn & Technol, Varanasi 221005, India
[2] Indian Inst Technol BHU, Dept Phys, Varanasi 221005, India
关键词
Self; -pinning; Colloids; Particle -size effect; Rough surface; CONTACT LINE; EVAPORATION; DYNAMICS; DROPLETS; DROPS;
D O I
10.1016/j.colsurfa.2024.133767
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Self-pinning colloids are integral to multiple applications from ink-jet printing to diagnostic platforms. The commercial surfaces involved in these applications are inherently rough and to mimic the same, we probe the self-pinning mechanistic using a model system of colloidal (sessile) droplet desiccating over a homogeneously rough surface having root-mean-square roughness, S-q(nm) similar to 0.36nm; (0 < Sq < 1). Further, the interplay of the particle diameter (d(nm) similar to 460; 30 ))with the substrate roughness induced length-scale on the evaporation modes of these desiccating colloidal droplets has been investigated with extensive experiments. The second parametric variation outlined the effect of varied particle concentration (phi, w/w% similar to 0.05, 0.1,1) on the pinning-depinning transition of the contact line during evaporation. These are characterised and quantified by contact angle goniometry and a general map of evaporation modes is proposed for such evaporating colloidal droplets induced by self-pinning of the dispersed colloids.
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页数:9
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