A GaAs/GaInP dual junction solar cell grown by molecular beam epitaxy

被引:0
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作者
代盼 [1 ,2 ]
陆书龙 [1 ]
季莲 [1 ]
何巍 [1 ]
边历峰 [1 ]
杨辉 [1 ]
有持佑之 [3 ]
吉田浩 [3 ]
内田史朗 [3 ]
池田昌夫 [3 ]
机构
[1] Suzhou Institute of Nano-Tech and Nano-Bionics,Chinese Academy of Sciences
[2] University of Chinese Academy of Sciences
[3] Advanced Material Laboratories,Sony Corporation,Atsugi
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TM914.4 [太阳能电池];
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摘要
We report the recent result of GaAs/GaInP dual-junction solar cells grown by all solid-state molecularbeamepitaxy(MBE).The device structure consists of a GaIn0.48P homojunction grown epitaxially upon a GaAs homojunction,with an interconnected GaAs tunnel junction.A photovoltaic conversion efficiency of 27% under the AM1.5 globe light intensity is realized for a GaAs/GaInP dual-junction solar cell,while the efficiencies of 26% and 16.6% are reached for a GaAs bottom cell and a GaInP top cell,respectively.The energy loss mechanism of our GaAs/GaInP tandem dual-junction solar cells is discussed.It is demonstrated that the MBE-grown phosphide-containing Ⅲ–V compound semiconductor solar cell is very promising for achieving high energy conversion efficiency.
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页码:66 / 69
页数:4
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