A HIGH-POWER EFFICIENT VUV F2 LASER-EXCITED BY AN ELECTRIC-DISCHARGE

被引：0

作者：

ISHCHENKO, VN

KOCHUBEI, SA

RAZHEV, AM

机构：

来源：

KVANTOVAYA ELEKTRONIKA | 1986年 / 13卷 / 05期

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1072 / 1075

页数：4

共 8 条

[1] EXCIMER ARF-XEF LASERS PROVIDING HIGH-POWER STIMULATED RADIATION IN AR-XE AND F-LINES [J].

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RAZHEV, AM .

APPLIED PHYSICS, 1977, 14 (02) :231-233

[2]

HOHLA K, 1979, OPTICS LASER TECHN, P305

[3] XEOSTAR PRODUCTION THROUGH COLLISIONAL ELECTRONIC-ENERGY TRANSFER FROM 2-PHOTON EXCITED XE ATOMS [J].

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PRITCHARD, D ;

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RHODES, CK .

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[4] OBSERVATION OF 2-PHOTON EXCITATION OF H-2 E,F SIGMA-1(G+) STATE [J].

KLIGLER, DJ ;

RHODES, CK .

PHYSICAL REVIEW LETTERS, 1978, 40 (05) :309-313

[5]

MCKEE TJ, 1980, PHYS CAN, V36, P41

[6] DISCHARGE PUMPED F-2 LASER AT 1580 A [J].

PUMMER, H ;

HOHLA, K ;

DIEGELMANN, M ;

REILLY, JP .

OPTICS COMMUNICATIONS, 1979, 28 (01) :104-106

[7] VUV EMISSIONS FROM MIXTURES OF F2 AND NOBLE-GASES - MOLECULAR F2 LASER AT 1575 A [J].

RICE, JK ;

HAYS, AK ;

WOODWORTH, JR .

APPLIED PHYSICS LETTERS, 1977, 31 (01) :31-33

[8] SUB-MICRON, VACUUM ULTRAVIOLET CONTACT LITHOGRAPHY WITH AN F2 EXCIMER LASER [J].

WHITE, JC ;

CRAIGHEAD, HG ;

HOWARD, RE ;

JACKEL, LD ;

BEHRINGER, RE ;

EPWORTH, RW ;

HENDERSON, D ;

SWEENEY, JE .

APPLIED PHYSICS LETTERS, 1984, 44 (01) :22-24

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