BARRIER INHOMOGENEITIES ON A SI-SIO2 INTERFACE BY SCANNING INTERNAL PHOTOEMISSION

被引：74

作者：

DISTEFAN.TH

机构：

来源：

APPLIED PHYSICS LETTERS | 1971年 / 19卷 / 08期

关键词：

D O I：

10.1063/1.1653918

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：280 / &

共 12 条

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