ABERRATIONS AND TOLERANCES IN A DOUBLE-DEFLECTION ELECTRON-BEAM SCANNING SYSTEM

被引:6
|
作者
THOMSON, MGR [1 ]
机构
[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974
来源
关键词
D O I
10.1116/1.568480
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:1156 / 1159
页数:4
相关论文
共 50 条
  • [41] STABLE CURRENT GENERATOR FOR ELECTRON-BEAM DEFLECTION.
    V'YUKHIN, V.N.
    KOVALEV, E.A.
    1982, V 25 (N 1 PT 2): : 147 - 149
  • [42] ELECTRON-BEAM DEFLECTION THEORETICAL AND PRACTICAL LIMITS OF PERFORMANCE
    WOODARD, OC
    HO, CT
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (03) : C103 - C103
  • [43] ELECTRON-BEAM INJECTION, DEFLECTION, AND TRANSPORT IN THE UNM BETATRON
    SCHAMILOGLU, E
    SIERGIEJ, DM
    HUMPHRIES, S
    PROCEEDINGS OF THE 1989 IEEE PARTICLE ACCELERATOR CONFERENCE, VOLS 1-3: ACCELERATOR SCIENCE AND TECHNOLOGY, 1989, : 1020 - 1022
  • [44] Image based in situ electron-beam drift detection by silicon photodiodes in scanning-electron microscopy and an electron-beam lithography system
    Kuo, Yi-Hung
    Wu, Cheng-Ju
    Kuo, Fu-Tsun
    Yen, Jia-Yush
    Chen, Yung-Yaw
    MICROELECTRONIC ENGINEERING, 2013, 103 : 137 - 143
  • [45] ELECTRON-BEAM DEFLECTION WHEN WELDING DISSIMILAR METALS
    WEI, PS
    LII, TW
    JOURNAL OF HEAT TRANSFER-TRANSACTIONS OF THE ASME, 1990, 112 (03): : 714 - 720
  • [46] OPTICAL BEAM DEFLECTION IMAGING OF THE ELECTRON-BEAM INTERACTION VOLUME IN SEMICONDUCTORS
    CHANG, GY
    GIVENS, RB
    SPICER, JWM
    OSIANDER, R
    MURPHY, JC
    APPLIED PHYSICS LETTERS, 1993, 63 (05) : 645 - 647
  • [47] Experimental research on electron-beam welding technology with a scanning electron beam
    Seregin, Yu N.
    Laptenok, V. D.
    Murygin, A., V
    Bocharov, A. N.
    21ST INTERNATIONAL SCIENTIFIC CONFERENCE RESHETNEV READINGS-2017, 2019, 467
  • [48] SCANNING ELECTRON-BEAM SYSTEM TURNS OUT IC WAFERS FAST
    WEBER, EV
    YOURKE, HS
    ELECTRONICS, 1977, 50 (23): : 96 - 101
  • [49] DESIGN OF A VARIABLE-APERTURE PROJECTION AND SCANNING SYSTEM FOR ELECTRON-BEAM
    GOTO, E
    SOMA, T
    IDESAWA, M
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 883 - 886
  • [50] SYSTEMATIC ELIMINATION OF THIRD ORDER ABERRATIONS IN ELECTRON BEAM SCANNING SYSTEM.
    Hosokawa, Teruo
    Optik (Jena), 1980, 56 (01): : 21 - 30