QUANTUM-CHEMICAL INVESTIGATION OF THE ADSORPTION OF THALLIUM ON METALS OF THE COPPER SUBGROUP

被引：0

作者：

KUZNETSOV, AM

KORSHIN, GV

SAIFULLIN, AR

机构：

来源：

SOVIET ELECTROCHEMISTRY | 1990年 / 26卷 / 06期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

An investigation of models of the deposition of thallium on copper, silver, and gold surfaces has been carried out by the quantum-chemical CNDO/2 method.

引用

页码：606 / 611

页数：6

共 11 条

[1] BEWICK A, 1976, J ELECTROANAL CHEM, V70, P239, DOI 10.1016/S0022-0728(76)80110-6
[2] ELLIPSOMETRY WITH PHASE AND AZIMUTH MODULATION - STUDY OF THE DIELECTRIC-CONSTANT OF FILMS OF THALLIUM AND SILVER ELECTROCHEMICALLY DEPOSITED ON GOLD ELECTRODES
CHAO, F
COSTA, M
[J]. THIN SOLID FILMS, 1981, 82 (01) : 3 - 21
[3] DISSOCIATION CURVES FOR 9 LOW-LYING STATES OF TL-2 FROM REP CL CALCULATIONS
CHRISTIANSEN, PA
[J]. JOURNAL OF CHEMICAL PHYSICS, 1983, 79 (06) : 2928 - 2931
[4] Kolb D. M., 1978, ADV ELECTROCHEMISTRY, p[11, 125]
[5] KOLB DM, 1974, J ELECTROANAL CHEM, V54, P25, DOI 10.1016/0368-1874(74)85093-8
[6] KORSHIN GV, 1988, DOUBLE LAYER ADSORPT, P187
[7] KUZNETSOV AM, 1987, ELEKTROKHIMIYA, V23, P1368
[8] STUDIES ON ADSORPTION OF METAL IONS ON GOLD ELECTRODE WITH TRIANGULAR VOLTAGE SWEEP METHOD
LORENZ, WJ
MOUMTZIS, I
SCHMIDT, E
[J]. JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1971, 33 (01): : 121 - &
[9] PETRII OA, 1987, ITOGI NAUKI TEKH E, V24, P94
[10] RADTSIG AA, 1986, PARAMETERS ATOMS ATO

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