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ANODIC-OXIDATION OF NEODYMIUM
被引:10
作者
:
NISHIKAWA, H
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Applied Chemistry, Osaka Institute of Technology, Asahi-ku, Osaka, 535
NISHIKAWA, H
MINAMI, S
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Applied Chemistry, Osaka Institute of Technology, Asahi-ku, Osaka, 535
MINAMI, S
机构
:
[1]
Department of Applied Chemistry, Osaka Institute of Technology, Asahi-ku, Osaka, 535
来源
:
ELECTROCHIMICA ACTA
|
1979年
/ 24卷
/ 03期
关键词
:
D O I
:
10.1016/0013-4686(79)85056-2
中图分类号
:
O646 [电化学、电解、磁化学];
学科分类号
:
081704 ;
摘要
:
The anodic oxidation of neodymium was investigated by the galvanostatic technique in Na2-HPO4 - ethylene glycol solution. According to the combination of measurments of ac capacity and of specular reflectivity, we obtained a refractive index for the oxide films as a function of wavelength and the value of apparent dielectric constant of the films for which sesquioxide Nd2O3 was assumed to have been produced. It was found that the film thickness could be determined from the wavelength of both maximum and minimum specular reflectivities due to interference, and that a linear relationship existed between the film thickness and the formation voltage. The slope of this linear line was 10.0Å V-1 or a mean field of 1.00 × 107 V cm-1 at 1 mA cm-2. The apparent current efficiency estimated from the thickness of the film vs passed charge plots scarcely depended on latter and its value was about 0.52, assuming that the film composition was Nd2O3. © 1979.
引用
收藏
页码:339 / 343
页数:5
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