LOW-ENERGY ION-BEAM ETCHING

被引：0

作者：

HARPER, JME

CUOMO, JJ

LEARY, PA

SUMMA, GM

KAUFMAN, HR

BRESNOCK, FJ

机构：

[1] IBM CORP,RES LAB,SAN JOSE,CA 95193

[2] COLORADO STATE UNIV,FT COLLINS,CO 80523

[3] IBM CORP,DIV SYST PROD,HOPEWELL JUNCTION,NY 12533

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 03期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C108 / C109

页数：2

共 50 条

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