ARGON BUBBLE FORMATION IN SPUTTERING OF PTSI

[1] PT2SI AND PTSI FORMATION WITH HIGH-PURITY PT THIN-FILMS [J]. APPLIED PHYSICS LETTERS, 1977, 31 (01) : 43 - 45

[2] CULLIS AG, UNPUBLISHED

[3] SURFACE-LAYER COMPOSITION CHANGES IN SPUTTERED ALLOYS AND COMPOUNDS [J]. APPLIED PHYSICS LETTERS, 1977, 30 (12) : 626 - 628

[4] LIAU ZL, UNPUBLISHED

[5] PICRAUX ST, 1974, APPLICATION ION BEAM

[6] KINETICS AND MECHANISM OF PLATINUM SILICIDE FORMATION ON SILICON [J]. APPLIED PHYSICS LETTERS, 1974, 24 (08) : 391 - 393

[7] SPUTTERING OF PTSI AND NISI [J]. NUCLEAR INSTRUMENTS & METHODS, 1976, 132 (JAN-F): : 345 - 349

[8] REVESEZ P, UNPUBLISHED

[9] SHENG TT, 1976, IEEE T ELECTRON DEV, V23, P531, DOI 10.1109/T-ED.1976.18447

[10] VANDERWEG WF, 1974, APPLICATION ION BEAM

[1] PT2SI AND PTSI FORMATION WITH HIGH-PURITY PT THIN-FILMS [J]. APPLIED PHYSICS LETTERS, 1977, 31 (01) : 43 - 45

[2] CULLIS AG, UNPUBLISHED

[3] SURFACE-LAYER COMPOSITION CHANGES IN SPUTTERED ALLOYS AND COMPOUNDS [J]. APPLIED PHYSICS LETTERS, 1977, 30 (12) : 626 - 628

[4] LIAU ZL, UNPUBLISHED

[5] PICRAUX ST, 1974, APPLICATION ION BEAM

[6] KINETICS AND MECHANISM OF PLATINUM SILICIDE FORMATION ON SILICON [J]. APPLIED PHYSICS LETTERS, 1974, 24 (08) : 391 - 393

[7] SPUTTERING OF PTSI AND NISI [J]. NUCLEAR INSTRUMENTS & METHODS, 1976, 132 (JAN-F): : 345 - 349

[8] REVESEZ P, UNPUBLISHED

[9] SHENG TT, 1976, IEEE T ELECTRON DEV, V23, P531, DOI 10.1109/T-ED.1976.18447

[10] VANDERWEG WF, 1974, APPLICATION ION BEAM