ARGON BUBBLE FORMATION IN SPUTTERING OF PTSI

被引：19

作者：

LIAU, ZL ^{[1
]}

SHENG, TT ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

APPLIED PHYSICS LETTERS | 1978年 / 32卷 / 11期

关键词：

D O I：

10.1063/1.89896

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：716 / 718

页数：3

共 10 条

[1] PT2SI AND PTSI FORMATION WITH HIGH-PURITY PT THIN-FILMS [J].

CANALI, C ;

CATELLANI, C ;

PRUDENZIATI, M ;

WADLIN, WH ;

EVANS, CA .

APPLIED PHYSICS LETTERS, 1977, 31 (01) :43-45

[2]

CULLIS AG, UNPUBLISHED

[3] SURFACE-LAYER COMPOSITION CHANGES IN SPUTTERED ALLOYS AND COMPOUNDS [J].

LIAU, ZL ;

BROWN, WL ;

HOMER, R ;

POATE, JM .

APPLIED PHYSICS LETTERS, 1977, 30 (12) :626-628

[4]

LIAU ZL, UNPUBLISHED

[5]

PICRAUX ST, 1974, APPLICATION ION BEAM

[6] KINETICS AND MECHANISM OF PLATINUM SILICIDE FORMATION ON SILICON [J].

POATE, JM ;

TISONE, TC .

APPLIED PHYSICS LETTERS, 1974, 24 (08) :391-393

[7] SPUTTERING OF PTSI AND NISI [J].

POATE, JM ;

BROWN, WL ;

HOMER, R ;

AUGUSTYNIAK, WM ;

MAYER, JW ;

TU, KN ;

VANDERWEG, WF .

NUCLEAR INSTRUMENTS & METHODS, 1976, 132 (JAN-F) :345-349

[8]

REVESEZ P, UNPUBLISHED

[9]

SHENG TT, 1976, IEEE T ELECTRON DEV, V23, P531, DOI 10.1109/T-ED.1976.18447

[10]

VANDERWEG WF, 1974, APPLICATION ION BEAM

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