THE PHOTOELECTROCHEMICAL BEHAVIOR OF FERRIC-OXIDE IN THE PRESENCE OF REDOX REAGENTS

被引：115

作者：

IWANSKI, P ^{[1
]}

CURRAN, JS ^{[1
]}

GISSLER, W ^{[1
]}

MEMMING, R ^{[1
]}

机构：

[1] PHILIPS FORSCHUNGSLAB HAMBURG GMBH,D-2000 HAMBURG 54,FED REP GER

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 10期

关键词：

D O I：

10.1149/1.2127202

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2128 / 2133

页数：6

共 15 条

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