CHARACTERIZATION STUDY OF NITROGEN-ION-IMPLANTED CONVENTIONAL CHROMIUM PLATINGS .6.

被引：1
|
作者：
FERBER, H
MOUNT, CK
HOFLUND, GB
HOSHINO, S
机构：
[1] UNIV FLORIDA,DEPT CHEM ENGN,GAINESVILLE,FL 32611
[2] MUSASHI INST TECHNOL,SETAGAYA KU,TOKYO 158,JAPAN
来源：
THIN SOLID FILMS | 1991年 / 203卷 / 01期
关键词：
D O I：
10.1016/0040-6090(91)90523-Z
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A previous study (H. Ferber, G. B. Hoflund, C. K. Mount and S. Hoshino, Surf. Interface Anal., 16 (1990) 488) has shown that the hardness of conventional chromium layers can be significantly enhanced by nitrogen ion implantation. The present study examines the complex chemical nature of nitrogen-ion-implanted conventional chromium films using electron spectroscopy for chemical analysis. Auger electron spectroscopy, depth profiling and ion scattering spectroscopy. Both the composition and chemical states of the species vary substantially with depth, and numerous forms of chromium, carbon, nitrogen and oxygen are present.
引用
收藏
页码：121 / 130
页数：10
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