RESISTANCE OF THIN METAL FILMS GROWN UNDER A LONGITUDINAL ELECTRIC FIELD

被引：23

作者：

AHILEA, E

HIRSCH, AA

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1971年 / 42卷 / 13期

关键词：

D O I：

10.1063/1.1659989

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：5601 / &

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