THE INFLUENCE OF MASS-TRANSPORT ON THE DEPOSIT MORPHOLOGY AND THE CURRENT EFFICIENCY IN PULSE PLATING OF COPPER

被引:56
作者
CHENE, O
LANDOLT, D
机构
关键词
D O I
10.1007/BF01062299
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:188 / 194
页数:7
相关论文
共 23 条
[1]   ELECTRODEPOSITION OF GOLD BY PULSED CURRENT [J].
CHEH, HY .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (04) :551-&
[2]  
CHEH HY, 1987, ELECTROCHEMICAL SOC, P555
[3]  
CHENE O, 1985, OBERFLACHE SURFACE, V26, P45
[4]   MASS-TRANSFER AND CURRENT-POTENTIAL RELATION IN PULSE ELECTROLYSIS [J].
CHIN, DT .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (08) :1657-1667
[5]   CONVECTIVE DIFFUSION ON A ROTATING SPHERICAL ELECTRODE [J].
CHIN, DT .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (09) :1434-&
[7]   EXPERIMENTAL INVESTIGATION OF MASS-TRANSPORT IN PULSE PLATING [J].
DATTA, M ;
LANDOLT, D .
SURFACE TECHNOLOGY, 1985, 25 (02) :97-110
[8]   SOME THEORETICAL ASPECTS OF PULSE ELECTROLYSIS [J].
IBL, N .
SURFACE TECHNOLOGY, 1980, 10 (02) :81-104
[9]  
IBL N, 1987, SURF TECHNOL, V6, P287
[10]  
IBL N, 1966, ADV ELECTROCHEMISTRY, V2, P48