MICROSTRUCTURE OF PLASMA-DEPOSITED A-SI-H FILMS

被引：261
|
作者：
KNIGHTS, JC
LUJAN, RA
机构：
来源：
APPLIED PHYSICS LETTERS | 1979年 / 35卷 / 03期
关键词：
D O I：
10.1063/1.91086
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：244 / 246
页数：3
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