INSITU CONDUCTIVITY AND HALL MEASUREMENTS OF ULTRATHIN NICKEL SILICIDE LAYERS ON SILICON(111)

[1] ELECTRICAL PROPERTIES OF HIGH-RESISTIVITY NICKEL-DOPED SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1970, 41 (06) : 2644 - &

[2] LEED INVESTIGATIONS ON THE INTERACTION OF PD AND NI WITH DIFFERENT SI(111) SURFACES [J]. SURFACE SCIENCE, 1984, 145 (01) : 87 - 100

[3] ELECTRICAL CHARACTERISTICS OF THIN NI2SI, NISI, AND NISI2 LAYERS GROWN ON SILICON [J]. JOURNAL OF ELECTRONIC MATERIALS, 1983, 12 (02) : 413 - 422

[4] FINZEL HU, 1986, ANN PHYS-LEIPZIG, V43, P5, DOI 10.1002/andp.19864980103

[5] CHARACTERIZATION OF ULTRATHIN NICKEL LAYERS ON SI(111) USING RHEED AND RBS [J]. APPLIED SURFACE SCIENCE, 1986, 27 (02) : 143 - 150

[6] The conductivity of thin metallic films according to the electron theory of metals [J]. PROCEEDINGS OF THE CAMBRIDGE PHILOSOPHICAL SOCIETY, 1938, 34 : 100 - 108

[7] TRANSPORT STUDIES IN SINGLE-CRYSTAL FILMS OF COSI2 AND NISI2 - A NEW CLASS OF QUASI-2-DIMENSIONAL METALS [J]. SURFACE SCIENCE, 1984, 142 (1-3) : 37 - 42

[8] HENSEL JC, 1986, MATER RES SOC S P, V54, P499

[9] CONDUCTIVITY AND MOBILITY IN VERY THIN EPITAXIAL NISI2 LAYERS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04): : 2127 - 2130

[10] ISCHIWARA H, 1979, SURF SCI, V86, P711

[1] ELECTRICAL PROPERTIES OF HIGH-RESISTIVITY NICKEL-DOPED SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1970, 41 (06) : 2644 - &

[2] LEED INVESTIGATIONS ON THE INTERACTION OF PD AND NI WITH DIFFERENT SI(111) SURFACES [J]. SURFACE SCIENCE, 1984, 145 (01) : 87 - 100

[3] ELECTRICAL CHARACTERISTICS OF THIN NI2SI, NISI, AND NISI2 LAYERS GROWN ON SILICON [J]. JOURNAL OF ELECTRONIC MATERIALS, 1983, 12 (02) : 413 - 422

[4] FINZEL HU, 1986, ANN PHYS-LEIPZIG, V43, P5, DOI 10.1002/andp.19864980103

[5] CHARACTERIZATION OF ULTRATHIN NICKEL LAYERS ON SI(111) USING RHEED AND RBS [J]. APPLIED SURFACE SCIENCE, 1986, 27 (02) : 143 - 150

[6] The conductivity of thin metallic films according to the electron theory of metals [J]. PROCEEDINGS OF THE CAMBRIDGE PHILOSOPHICAL SOCIETY, 1938, 34 : 100 - 108

[7] TRANSPORT STUDIES IN SINGLE-CRYSTAL FILMS OF COSI2 AND NISI2 - A NEW CLASS OF QUASI-2-DIMENSIONAL METALS [J]. SURFACE SCIENCE, 1984, 142 (1-3) : 37 - 42

[8] HENSEL JC, 1986, MATER RES SOC S P, V54, P499

[9] CONDUCTIVITY AND MOBILITY IN VERY THIN EPITAXIAL NISI2 LAYERS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04): : 2127 - 2130

[10] ISCHIWARA H, 1979, SURF SCI, V86, P711