NEW DIFFUSION-TYPE STRIPE-GEOMETRY INJECTION-LASER

被引:35
作者
MARSCHALL, P
SCHLOSSER, E
WOLK, C
机构
[1] AEG-Telefunken, Forschungsinstitut Ulm, D-7900 Ulm, West Germany
关键词
Semiconductor junction lasers;
D O I
10.1049/el:19790028
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The device structure, fabrication process and properties of a new diffusion-type stripe-geometry injection laser are described. A V-groove etched into the laser surface determines the shape of the diffusion front and defines the stripe width. This V-groove laser operates stably in the fundamental transverse mode and exhibits linear kink-free light/current characteristics up to 25 mW per mirror. © 1979, The Institution of Electrical Engineers. All rights reserved.
引用
收藏
页码:38 / 39
页数:2
相关论文
共 8 条
[1]   CHANNELED-SUBSTRATE PLANAR STRUCTURE (ALGA)AS INJECTION-LASERS [J].
AIKI, K ;
NAKAMURA, M ;
KURODA, T ;
UMEDA, J .
APPLIED PHYSICS LETTERS, 1977, 30 (12) :649-651
[2]  
GRUBER J, 1978, 4TH EUR C OPT COMM G
[3]   LASING CHARACTERISTICS OF VERY NARROW PLANAR STRIPE LASERS [J].
KOBAYASHI, T ;
KAWAGUCHI, H ;
FURUKAWA, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1977, 16 (04) :601-607
[4]  
PETERMANN K, 1978, AEU-INT J ELECTRON C, V32, P313
[5]  
TARNI Y, 1971, J ELECTROCHEM SOC, V118, P118
[6]   LATERAL-CURRENT CONFINEMENT IN A GAAS PLANAR STRIPE-GEOMETRY AND CHANNELED SUBSTRATE BURIED DH LASER USING REVERSE-BIASED P-N-JUNCTIONS [J].
TSANG, WT ;
LOGAN, RA .
JOURNAL OF APPLIED PHYSICS, 1978, 49 (05) :2629-2638
[7]   MESA-STRIPE-GEOMETRY DOUBLE-HETEROSTRUCTURE INJECTION LASERS [J].
TSUKADA, T ;
ITO, R ;
NAKASHIM.H ;
NAKADA, O .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1973, QE 9 (02) :356-361
[8]   GAAS-ALXGA1-XAS DOUBLE HETEROSTRUCTURE PLANAR STRIPE LASER [J].
YONEZU, H ;
SAKUMA, I ;
KOBAYASH.K ;
KAMEJIMA, T ;
UENO, M ;
NANNICHI, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1973, 12 (10) :1585-1592