INITIAL NUCLEATION OF PHOTO-CVD AMORPHOUS-SILICON BY PHOTODECOMPOSITION OF DISILANE

被引：0
|
作者：
KAWASAKI, M
HAYASHI, K
TSUKIYAMA, Y
HADA, H
机构：
来源：
NIPPON KAGAKU KAISHI | 1987年 / 11期
关键词：
D O I：
10.1246/nikkashi.1987.1928
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
引用
收藏
页码：1928 / 1933
页数：6
相关论文
共 50 条
  • [41] IN-SITU HYDROGENATION OF AMORPHOUS-SILICON PREPARED BY THERMAL-DECOMPOSITION OF DISILANE
    YAMANAKA, M
    HAYASHI, Y
    SAKATA, I
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1993, 32 (10A): : L1383 - L1386
  • [42] PHOTO-CVD DIRECT PATTERNING OF SILICON-OXIDE FILMS BY OPTICAL PROJECTION
    SUZUKI, Y
    SHINOGI, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1990, 29 (08): : L1517 - L1519
  • [43] INITIAL REACTIONS AT THE INTERFACE OF PT AND AMORPHOUS-SILICON
    NEMANICH, RJ
    THOMPSON, MJ
    JACKSON, WB
    TSAI, CC
    STAFFORD, BL
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (03): : 519 - 523
  • [44] STRUCTURAL AND ELECTRICAL-PROPERTIES OF PHOTO-CVD SILICON-NITRIDE FILM
    NUMASAWA, Y
    YAMAZAKI, K
    HAMANO, K
    KOBAYASHI, K
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (03) : C101 - C101
  • [45] Infrared spectroscopic study of mercury-sensitized photo-CVD silicon oxide
    Lan, W.H., 1600, (29):
  • [46] IMPROVEMENTS IN THE DISILANE PLASMA DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON SOLAR-CELLS
    VANIER, PE
    SU, FC
    SOLAR CELLS, 1987, 21 : 167 - 175
  • [47] LOW-TEMPERATURE PHOTO-CVD SILICON-NITRIDE - PROPERTIES AND APPLICATIONS
    PETERS, JW
    GEBHART, FL
    HALL, TC
    SOLID STATE TECHNOLOGY, 1980, 23 (09) : 121 - 126
  • [48] SUPERLATTICE STRUCTURE AMORPHOUS SI FILMS FABRICATED BY THE PHOTO-CVD METHOD AND THEIR DEVICE APPLICATIONS
    NAKANO, S
    TARUI, H
    MATSUYAMA, T
    NAKAMURA, N
    TSUDA, S
    WATANABE, K
    HAKU, H
    NISHIKUNI, M
    HISHIKAWA, Y
    OHNISHI, M
    KUWANO, Y
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C445 - C445
  • [49] PHYSICOCHEMICAL PROPERTIES OF PHOTO-CVD SILICON-NITRIDE THIN-FILMS
    BERTI, M
    MELIGA, M
    ROVAI, G
    STANO, S
    TAMAGNO, S
    THIN SOLID FILMS, 1988, 165 (01) : 279 - 290
  • [50] PHOTO-RECRYSTALLIZATION OF AMORPHOUS-SILICON BY INCOHERENT RADIATION
    EBIHARA, K
    JOHN, PK
    TONG, BY
    WONG, SK
    CHIK, KP
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (06) : C235 - C235
12345