SUBSURFACE COBALT DIFFUSION IN SILICON SINGLE-CRYSTAL FROM INFINITESIMALLY SMALL COBALT DIFFUSION SOURCE

被引：5
作者：
APPELBAUM, A
MALM, DL
MURARKA, SP
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 04期
关键词：
D O I：
10.1116/1.583680
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：858 / 864
页数：7
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