GOLD-INDUCED CLIMB OF DISLOCATIONS IN SILICON

被引：126

作者：

DASH, WC

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1960年 / 31卷 / 12期

关键词：

D O I：

10.1063/1.1735538

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2275 / 2283

页数：9

共 22 条

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DASH, WC .

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[8]

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[10] MECHANISM OF DIFFUSION OF COPPER IN GERMANIUM [J].

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