DEPTH PROFILING OF HELIUM IN NI AND NB - COMPARISON OF DIFFERENT METHODS

被引：40
|
作者：
SCHERZER, BMU
BAY, HL
BEHRISCH, R
BORGESEN, P
ROTH, J
机构：
来源：
NUCLEAR INSTRUMENTS & METHODS | 1978年 / 157卷 / 01期
关键词：
D O I：
10.1016/0029-554X(78)90590-6
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：75 / 81
页数：7
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