EVALUATION OF THICKNESS OF BARRIER-TYPE OF OXIDE LAYERS ON ALUMINUM

被引：0
|
作者：
MARKOVA, NE
GRIBKOV, SP
CHERNYSHEV, VV
LEBEDEV, VN
机构：
来源：
MEASUREMENT TECHNIQUES-USSR | 1968年 / 08期
关键词：
D O I：
暂无
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
引用
收藏
页码：1023 / +
页数：1
相关论文
共 50 条
  • [41] BARRIER-TYPE FILM GROWTH ON AN AL-CU ALLOY
    PAEZ, MA
    THOMPSON, GE
    AGUIRRE, MJ
    BUSTOS, O
    ZAGAL, J
    BOLETIN DE LA SOCIEDAD CHILENA DE QUIMICA, 1995, 40 (03): : 325 - 335
  • [42] Depth profiling analysis of barrier-type anodic aluminium oxide films formed on substrates of controlled roughness
    Trigoulet, N.
    Tuccitto, N.
    Delfanti, I.
    Licciardello, A.
    Molchan, I. S.
    Skeldon, P.
    Thompson, G. E.
    Tempez, A.
    Chapon, P.
    SURFACE AND INTERFACE ANALYSIS, 2011, 43 (1-2) : 183 - 186
  • [43] Incorporation of oxide nanoparticles into barrier-type alumina film via anodic oxidation combined with electrophoretic deposition
    Kamada, K
    Tokutomi, M
    Enomoto, N
    Hojo, J
    JOURNAL OF MATERIALS CHEMISTRY, 2005, 15 (33) : 3388 - 3394
  • [44] Static replication of barrier-type options via integral equations
    Kim, Kyoung-Kuk
    Lim, Dong-Young
    QUANTITATIVE FINANCE, 2021, 21 (02) : 281 - 294
  • [45] Effects of fluoride ions in the growth of barrier-type films on aluminium
    Elaish, R.
    Curioni, M.
    Gowers, K.
    Kasuga, A.
    Habazaki, H.
    Hashimoto, T.
    Skeldon, P.
    ELECTROCHIMICA ACTA, 2017, 245 : 854 - 862
  • [46] Odor control using the AC barrier-type plasma reactors
    Okubo, M
    Kuroki, T
    Kametaka, H
    Yamamoto, T
    IEEE TRANSACTIONS ON INDUSTRY APPLICATIONS, 2001, 37 (05) : 1447 - 1455
  • [47] Characterization protocol for a surface barrier-type alpha and beta detector
    Carvalho, M. S.
    Cardoso, D. O.
    Santos, A. D.
    Amorim, A. S.
    Balthar, M. C., V
    Arbach, M. N.
    Oliveira, L. S. R.
    Vital, H. C.
    XXII WORLD CONGRESS OF THE INTERNATIONAL MEASUREMENT CONFEDERATION (IMEKO 2018), 2018, 1065
  • [48] Textured Barium Hexaferrite Films on Silicon Substrates with Aluminum Oxide and Titanium Oxide Barrier Layers
    V. G. Kostishin
    A. Yu. Mironovich
    A. V. Timofeev
    R. I. Shakirzyanov
    I. M. Isaev
    A. V. Sorokin
    A. I. Ril’
    Russian Journal of Inorganic Chemistry, 2021, 66 : 1802 - 1810
  • [49] Textured Barium Hexaferrite Films on Silicon Substrates with Aluminum Oxide and Titanium Oxide Barrier Layers
    Kostishin, V. G.
    Mironovich, A. Yu
    Timofeev, A., V
    Shakirzyanov, R., I
    Isaev, I. M.
    Sorokin, A., V
    Ril, A., I
    RUSSIAN JOURNAL OF INORGANIC CHEMISTRY, 2021, 66 (12) : 1802 - 1810
  • [50] Dynamics and temperature dependence of etching processes of porous and barrier aluminum oxide layers
    Brevnov, DA
    Rao, GVR
    López, GP
    Atanassov, PB
    ELECTROCHIMICA ACTA, 2004, 49 (15) : 2487 - 2494
12345