REPLY TO COMMENTS ON MICROBANDS IN A SILICON-IRON CRYSTAL

被引：3
作者：
HU, H
机构：
来源：
ACTA METALLURGICA | 1963年 / 11卷 / 08期
关键词：
D O I：
10.1016/0001-6160(63)90077-4
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
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页码：1000 / &
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