REPLY TO COMMENTS ON MICROBANDS IN A SILICON-IRON CRYSTAL

被引：3

作者：

HU, H

机构：

来源：

ACTA METALLURGICA | 1963年 / 11卷 / 08期

关键词：

D O I：

10.1016/0001-6160(63)90077-4

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

引用

页码：1000 / &

共 50 条

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