INFLUENCE OF NATURE OF SI SUBSTRATE ON NICKEL SILICIDE FORMED FROM THIN NI FILMS

被引：162

作者：

OLOWOLAFE, JO ^{[1
]}

NICOLET, MA ^{[1
]}

MAYER, JW ^{[1
]}

机构：

[1] CALTECH,PASADENA,CA 91125

来源：

THIN SOLID FILMS | 1976年 / 38卷 / 02期

关键词：

D O I：

10.1016/0040-6090(76)90221-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：143 / 150

页数：8

共 12 条

[1]

BOWER RW, 1973, SOLID STATE ELECTRON, V16, P1461, DOI 10.1016/0038-1101(73)90063-4

[2] GROWTH KINETICS OBSERVED IN FORMATION OF METAL SILICIDES ON SILICON [J].

BOWER, RW ;

MAYER, JW .

APPLIED PHYSICS LETTERS, 1972, 20 (09) :359-&

[3]

CHU WK, 1974, APPL PHYS LETT, V27, P454

[4]

Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700

[5] IRON SILICIDE THIN-FILM FORMATION AT LOW-TEMPERATURES [J].

LAU, SS ;

FENG, JSY ;

OLOWOLAFE, JO ;

NICOLET, MA .

THIN SOLID FILMS, 1975, 25 (02) :415-422

[6]

LAU SS, 1975, COMMUNICATION DEC

[7] ANALYSIS OF THIN-FILM STRUCTURES WITH NUCLEAR BACKSCATTERING AND X-RAY-DIFFRACTION [J].

MAYER, JW ;

TU, KN .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01) :86-93

[8] KINETICS AND MECHANISM OF PLATINUM SILICIDE FORMATION ON SILICON [J].

POATE, JM ;

TISONE, TC .

APPLIED PHYSICS LETTERS, 1974, 24 (08) :391-393

[9] X-RAY ANALYSIS OF SPUTTERED FILMS OF BETA-TANTALUM AND BODY-CENTERED CUBIC TANTALUM [J].

READ, MH ;

HENSLER, DH .

THIN SOLID FILMS, 1972, 10 (01) :123-&

[10]

RUCH WVT, 1968, SOLID STATE ELECTRON, V11, P517

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