DIRECT-CURRENT ELECTRO-LUMINESCENCE AND THE NEODYMIUM LUMINESCENCE CENTER IN ND-DOPED ZNS THIN-FILMS

被引:11
|
作者
ZHONG, GZ [1 ]
BRYANT, FJ [1 ]
机构
[1] UNIV HULL,DEPT PHYS,HULL HU6 7RX,N HUMBERSIDE,ENGLAND
来源
JOURNAL OF PHYSICS C-SOLID STATE PHYSICS | 1980年 / 13卷 / 25期
关键词
D O I
10.1088/0022-3719/13/25/021
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
收藏
页码:4797 / 4804
页数:8
相关论文
共 50 条
  • [41] Influence of Al on the local structure of Nd-doped TiO2 thin films: A combined luminescence and X-ray absorption fine structure analysis
    Murayama, Mariko
    Yoda, Kensaku
    Komuro, Shuji
    Nitani, Hiroaki
    Crowe, Iain F.
    Zhao, Xinwei
    MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2019, 246 : 49 - 52
  • [42] DC ELECTRO-LUMINESCENCE IN INSNXOY-TA2O5-ZNS-MN-TA2O5-AL THIN-FILM STRUCTURES
    TORNQVIST, RO
    TUOMI, TO
    JOURNAL OF LUMINESCENCE, 1981, 24-5 (NOV) : 901 - 904
  • [43] Electron-paramagnetic-resonance study of the Mn2+ luminescence center in ZnS:Mn powder and thin films
    Yeom, TH
    Lee, YH
    Hahn, TS
    Oh, MH
    Choh, SH
    JOURNAL OF APPLIED PHYSICS, 1996, 79 (02) : 1004 - 1007
  • [44] DIRECT-CURRENT REACTIVE MAGNETRON-SPUTTERED ZINC-OXIDE THIN-FILMS - THE EFFECT OF THE SPUTTERING PRESSURE
    MENG, LJ
    DOSSANTOS, MP
    THIN SOLID FILMS, 1994, 250 (1-2) : 26 - 32
  • [45] DEPOSITION AND PROPERTIES OF YTTRIA-STABILIZED ZIRCONIA THIN-FILMS USING REACTIVE DIRECT-CURRENT MAGNETRON SPUTTERING
    THIELE, ES
    WANG, LS
    MASON, TO
    BARNETT, SA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (06): : 3054 - 3060
  • [46] ELECTROGENERATED CHEMI-LUMINESCENCE .36. PRODUCTION OF STEADY DIRECT-CURRENT ECL IN THIN-LAYER AND FLOW CELLS
    BRILMYER, GH
    BARD, AJ
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1980, 127 (01) : 104 - 110
  • [47] STRUCTURE AND PROPERTIES OF TITANIUM NITRIDE THIN-FILMS DEPOSITED AT LOW-TEMPERATURES USING DIRECT-CURRENT MAGNETRON SPUTTERING
    ELSTNER, F
    EHRLICH, A
    GIEGENGACK, H
    KUPFER, H
    RICHTER, F
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (02): : 476 - 483
  • [48] FUNDAMENTAL OPTICAL-ABSORPTION EDGE OF REACTIVELY DIRECT-CURRENT MAGNETRON SPUTTER-DEPOSITED ALN THIN-FILMS
    ZARWASCH, R
    RILLE, E
    PULKER, HK
    JOURNAL OF APPLIED PHYSICS, 1992, 71 (10) : 5275 - 5277
  • [49] Preparation of molybdenum-doped indium oxide thin films using reactive direct-current magnetron sputtering
    Li, XF
    Miao, WN
    Zhang, Q
    Huang, L
    Zhang, ZJ
    Hua, ZY
    JOURNAL OF MATERIALS RESEARCH, 2005, 20 (06) : 1404 - 1408
  • [50] Preparation of molybdenum-doped indium oxide thin films using reactive direct-current magnetron sputtering
    Xifeng Li
    Weina Miao
    Qun Zhang
    Li Huang
    Zhuangjian Zhang
    Zhongyi Hua
    Journal of Materials Research, 2005, 20 : 1404 - 1408