STRUCTUAL CHANGES OF ARSENIC SILICATE GLASSES WITH HEAT TREATMENTS

被引:26
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ARAI, E
TERUNUMA, Y
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10.1143/JJAP.9.691
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O59 [应用物理学];
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页码:691 / +
页数:1
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[1]  
ADAMS RV, 1961, PHYS CHEM GLASSES-B, V2, P101
[2]   THERMODYNAMICS OF ARSENIC IN GLASS [J].
BAAK, T .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1959, 42 (01) :27-29
[3]  
BELL T, 1962, PHYS CHEM GLASSES-B, V3, P141
[4]   GAMMA-INDUCED ABSORPTION AND STRUCTURAL STUDIES OF ARSENIC BORATE GLASSES [J].
BISHAY, AM ;
ARAFA, S .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1966, 49 (08) :423-&
[5]  
Burger R M, 1967, FUNDAMENTALS SILICON, V1
[6]  
CRANK J, 1956, MATHEMATICS DIFFUSIO
[7]   DIFFUSION OF DONOR AND ACCEPTOR ELEMENTS IN SILICON [J].
FULLER, CS ;
DITZENBERGER, JA .
JOURNAL OF APPLIED PHYSICS, 1956, 27 (05) :544-553
[8]   REDISTRIBUTION OF ACCEPTOR + DONOR IMPURITIES DURING THERMAL OXIDATION OF SILICON [J].
GROVE, AS ;
SAH, CT ;
LEISTIKO, O .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (09) :2695-&
[9]  
Kubaschewski O, 1951, METALLURGICAL THERMO
[10]   DIFFUSION INTO SILICON FROM AN ARSENIC-DOPED OXIDE [J].
LEE, DB .
SOLID-STATE ELECTRONICS, 1967, 10 (06) :623-&