APPLICATION OF OXIDE MASKING TO SILICON DIFFUSED TRANSISTORS

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作者：

LANZL, RH

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JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1959年 / 106卷 / 03期

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O646 [电化学、电解、磁化学];

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081704 ;

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页码：C62 / C62

页数：1

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