PREPARATION AND SOME PROPERTIES OF CHEMICALLY VAPOR-DEPOSITED SI-RICH SIO2 AND SI3N4 FILMS

被引：106
作者：
DONG, D
IRENE, EA
YOUNG, DR
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 05期
关键词：
D O I：
10.1149/1.2131555
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：819 / 823
页数：5
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