MORPHOLOGICAL AND STRUCTURAL-CHANGES IN LASER CVD OF SILICON - COMPARISON OF THEORETICAL TEMPERATURE CALCULATIONS WITH EXPERIMENTAL RESULTS

被引：1
|
作者：
MILNE, D [1 ]
WILSON, JIB [1 ]
RANTALA, TT [1 ]
LENKKERI, J [1 ]
机构：
[1] UNIV OULU,MICROELECTR & MAT PHYS LABS,SF-90570 OULU,FINLAND
来源：
APPLIED SURFACE SCIENCE | 1989年 / 43卷 / 1-4期
关键词：
16;
D O I：
10.1016/0169-4332(89)90194-3
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：81 / 86
页数：6
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