LATERAL AND DEPTH SCALE CALIBRATION OF THE POSITION-SENSITIVE ATOM-PROBE

被引:37
作者
HYDE, JM
CEREZO, A
SETNA, RP
WARREN, PJ
SMITH, GDW
机构
[1] University of Oxford, Department of Materials, Oxford, OX1 3PH, Parks Road
关键词
D O I
10.1016/0169-4332(94)90371-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In this paper a method is outlined to calibrate both the lateral and depth scales using a combination of FIM and PoSAP microanalysis. Results are given for the following alloy systems: Fe-45at%Cr, Cu-1at%Co, Al-3at%Zn-3 at%Mg-1at%Cu and Fe-1.3wt%Cu-1.4wt%Ni. For each system a direct relationship between the applied voltage and tip radius was found from indexed FIM images and estimates of the image compression factor. The reconstructed PoSAP data was divided into a series of frames in which each represented a fraction of an atomic layer evaporated. Individual rings were seen to collapse inwards when the frames were displayed in succession. The visual effect is similar to watching ring collapse in a FIM image when DC field evaporation occurs. A depth scale calibration was determined directly from the number of ions detected per plane evaporated. The lateral resolution of the wedge and strip anode was analysed by placing a thin mask, consisting of a series of small circular apertures, arranged in a concentric ring pattern, in front of the double channel plate assembly. A series of FIM images was generated and compared with a simulation of the expected distribution of ion impacts. In order to simulate a uniform detector resolution a Gaussian scatter was added to each coordinate in the x and y directions of the simulated impact positions. A comparison between the observed impact positions and simulations showed that approximately 96% of observations would be located to within one atomic spacing during a typical PoSAP experiment.
引用
收藏
页码:382 / 391
页数:10
相关论文
共 9 条
[1]   THE FIM100 - PERFORMANCE OF A COMMERCIAL ATOM PROBE SYSTEM [J].
CEREZO, A ;
SMITH, GDW ;
WAUGH, AR .
JOURNAL DE PHYSIQUE, 1984, 45 (NC9) :329-335
[2]   MATERIALS ANALYSIS WITH A POSITION-SENSITIVE ATOM PROBE [J].
CEREZO, A ;
GODFREY, TJ ;
GROVENOR, CRM ;
HETHERINGTON, MG ;
HOYLE, RM ;
JAKUBOVICS, JP ;
LIDDLE, JA ;
SMITH, GDW ;
WORRALL, GM .
JOURNAL OF MICROSCOPY-OXFORD, 1989, 154 :215-225
[3]  
DRESCHLER M, 1960, 4TH P INT C EL MICR, P835
[4]  
Gomer R., 1961, FIELD EMISSION FIELD
[5]  
MILLER M.K., 1989, ATOM PROBE MICROANAL
[6]   SITE OCCUPATION DETERMINATIONS BY APFIM FOR HF, FE, AND CO IN NI3AL [J].
MILLER, MK ;
HORTON, JA .
SCRIPTA METALLURGICA, 1986, 20 (08) :1125-1130
[7]  
NEWMAN RW, 1967, J SCI INSTRUM, V44, P127
[8]   FIELD-ION IMAGE-FORMATION [J].
TSONG, TT .
SURFACE SCIENCE, 1978, 70 (01) :211-233
[9]  
Wilkes T. J., 1974, Metallography, V7, P403, DOI 10.1016/0026-0800(74)90041-X