R F PLASMA DEPOSITION OF SILICON-NITRIDE LAYERS

被引：56
作者：
HELIX, MJ
VAIDYANATHAN, KV
STREETMAN, BG
DIETRICH, HB
CHATTERJEE, PK
机构：
[1] UNIV ILLINOIS,DEPT ELECT ENGN,URBANA,IL 61801
[2] NAVAL RES LAB,WASHINGTON,DC 20375
[3] TEXAS INSTRUMENTS INC,CENT RES LABS,DALLAS,TX 75222
来源：
THIN SOLID FILMS | 1978年 / 55卷 / 01期
关键词：
D O I：
10.1016/0040-6090(78)90082-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：143 / 148
页数：6
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