REACTIVE ARC VAPOR ION DEPOSITION OF TIN, ZRN AND HFN

被引：51
作者：
JOHANSEN, OA
DONTJE, JH
ZENNER, RLD
机构：
[1] Andal Corp, St. Paul, MN, USA, Andal Corp, St. Paul, MN, USA
来源：
THIN SOLID FILMS | 1987年 / 153卷
关键词：
D O I：
10.1016/0040-6090(87)90171-4
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
21
引用
收藏
页码：75 / 82
页数：8
相关论文
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