H+ AND D+ SPUTTERING OF THIN TANTALUM FILMS IN THE ENERGY-RANGE OF 0.6-KEV TO 15-KEV

被引：2
|
作者：
MEYER, CH
SMITH, JN
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 02期
关键词：
Compendex;
D O I：
10.1116/1.569920
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
TANTALUM AND ALLOYS
引用
收藏
页码：248 / 250
页数：3
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