OXYGEN SEGREGATION IN CZ SILICON CRYSTAL-GROWTH ON APPLYING A HIGH AXIAL MAGNETIC-FIELD

被引：14
作者：
KIM, KM
SMETANA, P
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 08期
关键词：
D O I：
10.1149/1.2108993
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1682 / 1686
页数：5
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