BIAS-INDUCED STRESS TRANSITIONS IN SPUTTERED TIN FILMS

被引：50

作者：

KATTELUS, HP ^{[1
]}

TANDON, JL ^{[1
]}

SALA, C ^{[1
]}

NICOLET, MA ^{[1
]}

机构：

[1] CALTECH,PASADENA,CA 91125

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 04期

关键词：

D O I：

10.1116/1.573776

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1850 / 1854

页数：5

共 21 条

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[8]

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[10] INFLUENCE OF SUBSTRATE BIAS ON THE COMPOSITION, STRUCTURE AND ELECTRICAL-PROPERTIES OF REACTIVELY DC-SPUTTERED TIN FILMS [J].

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